Two band-stop SERs (resonator A and resonator B) on silicon membrane were obtained and characterized. The frequency tunability domain of these resonators was between 3 GHz and 9.5 GHz ca. obtained by changing the dc magnetic bias field between Happl = 0.02 T and Happl = 0.34 T. The measurements of the S21 parameter demonstrate a suppression of more than 20 dB of the high order modes, showing a good selectivity of this kind of resonator. The rejection ratio was better than -20 dB in the frequency domain from f = 3 GHz to f = 9.5 GHz for the resonator A and better than -20 dB between f = 4.2 GHz and f = 9.5 GHz for the resonator B. These results demonstrate the possibility to obtain microwave band-stop resonators supported on silicon membrane with high isolation and rejection ratios.

Band-Stop Magnetostatic Wave Resonators on Micromachined Silicon Membrane

Marcelli R;
2003

Abstract

Two band-stop SERs (resonator A and resonator B) on silicon membrane were obtained and characterized. The frequency tunability domain of these resonators was between 3 GHz and 9.5 GHz ca. obtained by changing the dc magnetic bias field between Happl = 0.02 T and Happl = 0.34 T. The measurements of the S21 parameter demonstrate a suppression of more than 20 dB of the high order modes, showing a good selectivity of this kind of resonator. The rejection ratio was better than -20 dB in the frequency domain from f = 3 GHz to f = 9.5 GHz for the resonator A and better than -20 dB between f = 4.2 GHz and f = 9.5 GHz for the resonator B. These results demonstrate the possibility to obtain microwave band-stop resonators supported on silicon membrane with high isolation and rejection ratios.
2003
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
Editor(s): Siegfried W. Janson
Proceedings of the SPIE International Symposium on Micromachining and Microfabrication, MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II, Conference 4981
SPIE International Symposium on Micromachining and Microfabrication, MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II, Conference 4981
4981
156
163
8
9780819447814
SPIE, The International Society for Optical Engineering
BELLINGHAM
STATI UNITI D'AMERICA
Sì, ma tipo non specificato
28-29 January 2003
San Jose, California, USA
Magnetostatic Waves
Resonators
Micromachining
4
none
Marcelli, R; Sajin, G; Craciunoiu, F; Cismaru, A
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/150105
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