GENTILI, MASSIMO
GENTILI, MASSIMO
Istituto Nazionale di Ottica - INO
Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography
1998 Cui Z;Gerardino A;Gentili M;DiFabrizio E;Prewett; PD
Status of the Tosca Project: the Back-scattering portion Tosca-1
1998 Zoppi, M; Celli, M; Checchi, C; Colognesi, D; Rossi Albertini, V; Contarini, S; De Angelis, L; Gariazzo, C; Nataletti, P; Baciocchi, M; Difabrizio, E; Gentili, M
Modelling of electron beam scattering in high resolution lithography for the fabrication of Xray masks
1990 Gentili, M; Lucchesini, A; Scopa, L; Lugli, P; Paoletti, A; Messina, G; Santangelo, S; Tucciarone, A
Resolution limitation in EBL optical grating fabrication on InGaAsP/InP substrate
1990 Gentili, M; Lucchesini, A; Grella, L; Meneghini, G; Scopa, L
X-ray mask making by EBL and Monte Carlo analysis of a single-resist layer process on low-Z membrane
1989 Gentili, M; Lucchesini, A; Lugli, P; Messina, G; Paoletti, A; Santangelo, S; Tucciarone, A; Petrocco, G
Gas sensors based on improoved SAW device
1986 D'Amico, A; Gentili, M; Verardi, P; Verona, E
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography | 1-gen-1998 | Cui Z;Gerardino A;Gentili M;DiFabrizio E;Prewett; PD | |
| Status of the Tosca Project: the Back-scattering portion Tosca-1 | 1-gen-1998 | Zoppi, M; Celli, M; Checchi, C; Colognesi, D; Rossi Albertini, V; Contarini, S; De Angelis, L; Gariazzo, C; Nataletti, P; Baciocchi, M; Difabrizio, E; Gentili, M | |
| Modelling of electron beam scattering in high resolution lithography for the fabrication of Xray masks | 1-gen-1990 | Gentili, M; Lucchesini, A; Scopa, L; Lugli, P; Paoletti, A; Messina, G; Santangelo, S; Tucciarone, A | |
| Resolution limitation in EBL optical grating fabrication on InGaAsP/InP substrate | 1-gen-1990 | Gentili, M; Lucchesini, A; Grella, L; Meneghini, G; Scopa, L | |
| X-ray mask making by EBL and Monte Carlo analysis of a single-resist layer process on low-Z membrane | 1-gen-1989 | Gentili, M; Lucchesini, A; Lugli, P; Messina, G; Paoletti, A; Santangelo, S; Tucciarone, A; Petrocco, G | |
| Gas sensors based on improoved SAW device | 1-gen-1986 | D'Amico, A; Gentili, M; Verardi, P; Verona, E |