Gas flow and background gas density in NIO1 beam source

NIO1 (Negative Ion Optimization 1) is a versatile ion source designed to study the physics of production and acceleration of H- beams up to 60 keV. In ion sources, the gas is steadily injected in the plasma source to sustain the discharge, while high vacuum is maintained by a dedicated pumping system located in the vessel. This report presents experimental tests and calculations carried out to characterize the gas flow in NIO1. The three dimensional gas flow in NIO1 is studied in the molecular flow regime by the AVOCADO code. The analysis of the gas density profile along the accelerator considers the influence of effective gas temperature in the source, of the gas temperature accommodation by collisions at walls, and of the gas particle mass. The calculated source and vessel pressures are compared with experimental measurements in NIO1 during steady gas injection. This work was also presented at ICIS conference.