A process for incorporating one or more particles in a conducting or semiconducting surface layer of a surface layer of the support, which comprises the steps of positioning one or more particles on the surface of the conducting surface layer and applying an electrical potential between the surface of the conducting surface layer and a second conducting surface, in an environment that contains an electrolyte, producing a modification of the chemical and/or physical state of the surface layer of the support and/or of the surface of the surface layer of the support and/or of the particle and incorporation of the particle or particles on the surface of the surface layer of the support.
Incorporation of particle in conducting or semiconducting surface layer of surface layer of support involves producing modification of chemical and/or physical state of surface layer and incorporation of particles on surface of support
Cristiano AlbonettiCo-primo
Methodology
2009
Abstract
A process for incorporating one or more particles in a conducting or semiconducting surface layer of a surface layer of the support, which comprises the steps of positioning one or more particles on the surface of the conducting surface layer and applying an electrical potential between the surface of the conducting surface layer and a second conducting surface, in an environment that contains an electrolyte, producing a modification of the chemical and/or physical state of the surface layer of the support and/or of the surface of the surface layer of the support and/or of the particle and incorporation of the particle or particles on the surface of the surface layer of the support.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.


