IMPRONTA, MAURIZIO PIO
IMPRONTA, MAURIZIO PIO
Istituto per la Microelettronica e Microsistemi - IMM - Sede Secondaria Bologna
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Electromigration Reliability Assessment of Cu-based Metallization Systems by a Wafer-Level Approach
2007 Impronta, M; Marras, A; De Munari, I; Scorzoni, A; Valentini, Mg
Wide-band modelling of CMOS interconnections and voiding damages with the lumped element LE-FDTD method
2004 Alimenti F.; Impronta M.; Scorzoni A.; Roselli L.
Are high resolution resistometric methods really useful for the early detection of electromigration damage?
1997 A Scorzoni; S Franceschini; R Balboni; M Impronta; I De Munari; F Fantini
RAPID ISOTHERMAL ANNEALING OF ION IMPLANTED SILICON DEVICES BY UNIFORM LARGE AREA IRRADIATION WITH A NEW ELECTRON BEAM SYSTEM.
1983 Dori, Leonello; Impronta, Maurizio; Lulli, Giorgio; Merli, Pier Giorgio; Severi, Maurizio
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Electromigration Reliability Assessment of Cu-based Metallization Systems by a Wafer-Level Approach | 1-gen-2007 | Impronta, M; Marras, A; De Munari, I; Scorzoni, A; Valentini, Mg | |
| Wide-band modelling of CMOS interconnections and voiding damages with the lumped element LE-FDTD method | 1-gen-2004 | Alimenti F.; Impronta M.; Scorzoni A.; Roselli L. | |
| Are high resolution resistometric methods really useful for the early detection of electromigration damage? | 1-gen-1997 | A Scorzoni; S Franceschini; R Balboni; M Impronta; I De Munari; F Fantini | |
| RAPID ISOTHERMAL ANNEALING OF ION IMPLANTED SILICON DEVICES BY UNIFORM LARGE AREA IRRADIATION WITH A NEW ELECTRON BEAM SYSTEM. | 1-gen-1983 | Dori, Leonello; Impronta, Maurizio; Lulli, Giorgio; Merli, Pier Giorgio; Severi, Maurizio |