LOSURDO, MARIA
LOSURDO, MARIA
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
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Risultati 1 - 9 di 9 (tempo di esecuzione: 0.021 secondi).
In Situ Characterisations of Epitaxial Growth
2014 Brown, As; Losurdo, M
Real-Time Ellipsometry for Probing Charge-Transfer Processes at the Nanoscale
2013 M. Losurdo; AS Brown; G Bruno
Ellipsometry of Graphene
2012 Oates, Th; Losurdo, M; Bruno, G; Gajic, R
Graphene Production and Applications
2012 Losurdo, M; Bruno, G
Micro and nanostructuring of Graphene Using UV-NIL
2012 Bergmair, I; Losurdo, M; Bruno, G; Gajic, R
Fabrication of Metamaterials using Graphene
2010 Bergmair, I; Muhlberger, M; Schoftner, R; Losurdo, M; Bruno, G; Gajic, R; Isic, G; Kafesaki, M; Soukoulis, Cm; Hingerl, K
NIM_NIL Fabrication of graphene inclusions
2010 G. Bruno; M. Losurdo; I. Bergmair
New items in GaN MOCVD growth: Plasma processing and in situ Real Time Ellipsometry Monitoring
1999 M. Losurdo; P. Capezzuto; G. Bruno
Plasma deposition and treatment of semiconductor materials
1998 G. Bruno; P. Capezzuto; G. Cicala;M. Losurdo
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| In Situ Characterisations of Epitaxial Growth | 1-gen-2014 | Brown, As; Losurdo, M | |
| Real-Time Ellipsometry for Probing Charge-Transfer Processes at the Nanoscale | 1-gen-2013 | M. Losurdo; AS Brown; G Bruno | |
| Ellipsometry of Graphene | 1-gen-2012 | Oates, Th; Losurdo, M; Bruno, G; Gajic, R | |
| Graphene Production and Applications | 1-gen-2012 | Losurdo, M; Bruno, G | |
| Micro and nanostructuring of Graphene Using UV-NIL | 1-gen-2012 | Bergmair, I; Losurdo, M; Bruno, G; Gajic, R | |
| Fabrication of Metamaterials using Graphene | 1-gen-2010 | Bergmair, I; Muhlberger, M; Schoftner, R; Losurdo, M; Bruno, G; Gajic, R; Isic, G; Kafesaki, M; Soukoulis, Cm; Hingerl, K | |
| NIM_NIL Fabrication of graphene inclusions | 1-gen-2010 | G. Bruno; M. Losurdo; I. Bergmair | |
| New items in GaN MOCVD growth: Plasma processing and in situ Real Time Ellipsometry Monitoring | 1-gen-1999 | M. Losurdo; P. Capezzuto; G. Bruno | |
| Plasma deposition and treatment of semiconductor materials | 1-gen-1998 | G. Bruno; P. Capezzuto; G. Cicala;M. Losurdo |