ZANELLA, PIERINO

ZANELLA, PIERINO  

CHIMICA INORGANICA E DELLE SUPERFICI (attivo dal 18/11/1923 al 31/12/2021)  

Mostra records
Risultati 1 - 20 di 156 (tempo di esecuzione: 0.026 secondi).
Titolo Data di pubblicazione Autore(i) File
"Insertion reactions of isocyanides into Zr-N bond: Synthesis, Characterization and Catalytic Activity of New Imino-Carbamoyl Zirconium Complexes." 1-gen-2002 Carta, G; Cavinato, G; Crociani, L; Paolucci, G; Rossetto, G; Veronese, F; Zanella, P
"Ricerca e sviluppo di nuovi materiali e rivestimenti nanostrutturati (tecnologia MOCVD e precursori metallorganici) nel settore della meccanica e dei metalli. "METAL" 1-gen-2007 Crociani, L; Zanella, P; Carta, G; Rossetto, G; Nuova, Ompi; Perugini, Srl; LA MONTAGGI MECCANICI, Srl
A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors 1-gen-2005 Carta, G; Natali, M; Rossetto, G; Zanella, P; Salmaso, G; Restello, S; Rigato, V; Kaciulis, S; Mezzi, A
A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors. 1-gen-2003 Carta, G; Natali, M; Rossetto, G; Zanella, P; Salmaso, G; Rigato, V
A study of nanophasic tungsten oxides thin films by XPS 1-gen-2001 Zanella, Pierino; Carta, Giovanni; Barreca, Davide; Rossetto, GILBERTO LUCIO
A versatile single-source precursor for the synthesis of LaCoO3 films 1-gen-2008 Armelao, L; Bottaro, G; Crociani, L; Seraglia, R; Tondello, E; Zanella, P
Al2O3 growth optimisation using aluminium dimethylisopropoxide as precursor as a function of reaction conditions and reacting gases 1-gen-2001 D. Barreca; G.A. Battiston; G. Carta; R. Gerbasi; G. Rossetto; E. Tondello;P. Zanella
Al2O3 growth optimisation using aluminium dimethylisopropoxyde as precursor as a function of reaction conditions and reacting gases 1-gen-2001 Zanella, Pierino; Carta, Giovanni; Gerbasi, Rosalba; Barreca, Davide; Rossetto, GILBERTO LUCIO
Aminolysis of the Si-Cl bond and ligand exchange reaction betwee silicon amido derivatives and SiCl4: synthetic applications and kinetic investigations 1-gen-2003 Passarelli, V; Carta, G; Rossetto, G; Zanella, P
Anticorrosion performance evaluation of Al2O3 coatings deposited by MOCVD on an industrial brass substrate 1-gen-2003 Moretti G.; Guidi F.; Carta G.; Natali M.; Rossetto G.; Zanella P.; Salmaso G.; Rigato V.
Atomic layer deposition of zirc oxide 1-gen-2009 Bolzan M. ; Armelao L. ; Natali M. ; Rossetto G. ; Sartori A. ; Visentin F. ; Zanella P.
Attempts to deposit Nb3Sn by MOCVD 1-gen-2006 Carta, G.; Rossetto, G.; Zanella, P.; Crociani, L.; Palmieri, V.; Todescato, F.
Caratterizzazione spettroscopica di film sottili di platino ottenuti via MOCVD su substrati di quarzo e CaF2 1-gen-2001 Zanella, Pierino; Carta, Giovanni; Fabrizio, Monica; Barreca, Davide; Barison, Simona; Rossetto, GILBERTO LUCIO
Characterisation studies of nanophasic CeO2-ZrO2 multilayers obtained by CVD 1-gen-2001 D. Barreca; E. Tondello; G.A. Battiston; R. Gerbasi; P. Zanella; S. Barison; S. Daolio; M. Fabrizio
Chemical and structural aspects of cyclopentadienyl uranium(IV) tetrahydroborato complexes 1-gen-1988 Zanella, P; Brianese, N; Casellato, U; Ossola, F; Porchia, M; Rossetto, G; Graziani, R
Chemical composition of magnesium boride films obtained by CVD 1-gen-2008 Crociani L. ; Carta G. ; Kaciulis S. ; Mezzi A. ; Rossetto G. ; Zanella P.
Chemical Vapor Deposition of CeO2/ZrO2 nanocrystalline thin films for catalytic applications 1-gen-2001 Armelao, Lidia; Battiston, Giovanni; Gerbasi, Rosalba; Barreca, Davide; Zanella, Pierino
Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds 1-gen-2008 Carta, G; El Habra, N; Rossetto, G; Crociani, L; Torzo, G; Zanella, P; Casarin, M; Cavinato, G; Pace, G; Kaciulis, S; Mezzi, A
Chemical Vapor Deposition of MgO thin films from bis(Methylcyclopentadienyl) Magnesium 1-gen-2006 Carta, G; El Habra, N; Crociani, L; Rossetto, G; Zanella, P; Zanella, A; Paolucci, G; Barreca, D; Tondello, E
Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films depositrd by metal organic chemical vapour deposition on AISI 304 stainless steel 1-gen-2005 Natali, M; Carta, G; Rigato, V; Rossetto, G; Salmaso, G; Zanella, P