CICALA, GRAZIA
CICALA, GRAZIA
Istituto per la Scienza e Tecnologia dei Plasmi - ISTP - Sede Secondaria Bari
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Innovative photocathodes based on Nanodiamond layers
2018 L. Velardi; V. Nassisi; L. Monteduro; A.P. Caricato; G. Cicala
KrF laser irradiation of highly efficient photocathodes based on nanodiamond layers
2018 Velardi, L; Turco, V; Martina, L; Nassisi, V; Cicala, G
Photoemission tuning of nanodiamond particles treated in variable percentages of H2-N2 plasmas
2017 Velardi, L; Valentini, A; Cicala, G
Plasma deposition of microcrystalline silicon: role of plasma-surface interaction on the microstructure.
2001 G. Cicala; G. Bruno;P. Capezzuto
Plasma deposition and treatment of semiconductor materials
1998 G. Bruno; P. Capezzuto; G. Cicala;M. Losurdo
Chemistry of Amorphous Silicon Deposition Processes : Fundamentals and Controversial Aspects
1995 Giovanni Bruno; Pio Capezzuto;Grazia Cicala
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Innovative photocathodes based on Nanodiamond layers | 1-gen-2018 | L. Velardi; V. Nassisi; L. Monteduro; A.P. Caricato; G. Cicala | |
| KrF laser irradiation of highly efficient photocathodes based on nanodiamond layers | 1-gen-2018 | Velardi, L; Turco, V; Martina, L; Nassisi, V; Cicala, G | |
| Photoemission tuning of nanodiamond particles treated in variable percentages of H2-N2 plasmas | 1-gen-2017 | Velardi, L; Valentini, A; Cicala, G | |
| Plasma deposition of microcrystalline silicon: role of plasma-surface interaction on the microstructure. | 1-gen-2001 | G. Cicala; G. Bruno;P. Capezzuto | |
| Plasma deposition and treatment of semiconductor materials | 1-gen-1998 | G. Bruno; P. Capezzuto; G. Cicala;M. Losurdo | |
| Chemistry of Amorphous Silicon Deposition Processes : Fundamentals and Controversial Aspects | 1-gen-1995 | Giovanni Bruno; Pio Capezzuto;Grazia Cicala |