We report on the simultaneous fabrication by interference litography of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The moirè effect is used in the litographic process to fabricate complex structures which coul find application in photonic bandgap devices
Double-face and sub-micron two-dimensional patterning in congruent lithium niobate
LSansone;S De Nicola;
2006
Abstract
We report on the simultaneous fabrication by interference litography of two-dimensional submicron engineered domain patterns on both crystal faces, in congruent lithium niobate. The moirè effect is used in the litographic process to fabricate complex structures which coul find application in photonic bandgap devicesFile in questo prodotto:
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