X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer.
XPS composition study of stacked Si oxide/Si nitride/Si oxide nano-layers
C Wiemer
2012
Abstract
X-ray Photoelectron Spectroscopy (XPS) was used to investigate the silicon nitride composition in stacked Si oxide/Si nitride/Si oxide nano-layers. The standard approach for stoichiometry estimation, valid for homogeneous compositions, was corrected for the case of very small thickness and thin overlayer.File in questo prodotto:
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