The magnetic anisotropy of epitaxial Cu-Ni-Cu-Si(001) films, with Ni thickness between 17 and 150 A , has been studied by Brillouin light scattering from spin waves. Both the Néel interface anisotropy term and the second-order magnetoelastic coefficient have been assumed as adjustable parameters in the best fit procedure of the effective anisotropy constant as a function of the Ni thickness. These results are in very good agreement with those previously obtained by torque magnetometry

Magnetic anisotropy of thin Ni(001) films: comparison between static and dynamic techniques

Gianluca Gubbiotti;
2002

Abstract

The magnetic anisotropy of epitaxial Cu-Ni-Cu-Si(001) films, with Ni thickness between 17 and 150 A , has been studied by Brillouin light scattering from spin waves. Both the Néel interface anisotropy term and the second-order magnetoelastic coefficient have been assumed as adjustable parameters in the best fit procedure of the effective anisotropy constant as a function of the Ni thickness. These results are in very good agreement with those previously obtained by torque magnetometry
2002
Istituto Officina dei Materiali - IOM -
Brillouin light scattering
magnetic anisotropy
magnetic films
spin waves
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/121910
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