We have used transmission electron microscopy in the high resolution and the dark field modes as well as atomic force microscopy to compare quantum wire structures grown by organometallic chemical vapour deposition at different pressures. The interfaces are more abrupt and develop better defined facets when growing at low pressure than at intermediate and atmospheric pressure. Growth at low pressure therefore has a potential for fabrication of smaller structures with less size variations than the conventional atmospheric pressure growth.

Microscopy Characterization of Quantum Wires Grown on Grooved Substrates

G Biasiol;
1995

Abstract

We have used transmission electron microscopy in the high resolution and the dark field modes as well as atomic force microscopy to compare quantum wire structures grown by organometallic chemical vapour deposition at different pressures. The interfaces are more abrupt and develop better defined facets when growing at low pressure than at intermediate and atmospheric pressure. Growth at low pressure therefore has a potential for fabrication of smaller structures with less size variations than the conventional atmospheric pressure growth.
1995
Inglese
Cullis, AG; StatonBevan, AE
Institute-of-Physics Conference on Microscopy of Semiconducting Materials 1995
146
375
0-7503-0347-6
IOP PUBLISHING LTD
BRISTOL BS1 6BE
REGNO UNITO DI GRAN BRETAGNA
Oxford
6
none
Gustafsson, A; Dwir, B; Reinhardt, F; Biasiol, G; Bonard, Jm; Kapon, E
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/122548
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 4
social impact