We have developed an all-polymer procedure for sub-microscale large area patterning of fused silica plates based on electron beam lithography. The procedure relies on the use of a high sensitivity resist, negative tone epoxy-based SU-8 and a conducting polymer, a doped PDOT, as the electron discharge layer. The chemically amplified resist SU-8 allows for a five-fold increase in exposure speed as compared to standard PMMA, and the PDOT layer makes it possible to avoid the time-consuming deposition of a metallic layer and its critical removal. Gratings of stripes and pillars, possibly useful for the realization of photonic devices, are demonstrated.
High throughput electron beam lithography on insulating substrates for photonic devices
2007
Abstract
We have developed an all-polymer procedure for sub-microscale large area patterning of fused silica plates based on electron beam lithography. The procedure relies on the use of a high sensitivity resist, negative tone epoxy-based SU-8 and a conducting polymer, a doped PDOT, as the electron discharge layer. The chemically amplified resist SU-8 allows for a five-fold increase in exposure speed as compared to standard PMMA, and the PDOT layer makes it possible to avoid the time-consuming deposition of a metallic layer and its critical removal. Gratings of stripes and pillars, possibly useful for the realization of photonic devices, are demonstrated.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
