In order to obtain a rapid and non-destructive method for the evaluation of the thickness of polycrystalline thin films of TiO2 or Ga2O3 deposited on alumina substrates, a procedure based on X-ray absorption, and employing X-ray diffraction at glancing angles, was optimized. The results were compared with SEM observations and an agreement within 25% was obtained.

Thickness determination of ceramic thin films by X-ray absorption analysis

Gerbasi R;Porchia M;
1995

Abstract

In order to obtain a rapid and non-destructive method for the evaluation of the thickness of polycrystalline thin films of TiO2 or Ga2O3 deposited on alumina substrates, a procedure based on X-ray absorption, and employing X-ray diffraction at glancing angles, was optimized. The results were compared with SEM observations and an agreement within 25% was obtained.
1995
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
88-86538-04-9
ceramic
thin films
X-ray
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/124409
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