In order to obtain a rapid and non-destructive method for the evaluation of the thickness of polycrystalline thin films of TiO2 or Ga2O3 deposited on alumina substrates, a procedure based on X-ray absorption, and employing X-ray diffraction at glancing angles, was optimized. The results were compared with SEM observations and an agreement within 25% was obtained.
Thickness determination of ceramic thin films by X-ray absorption analysis
Gerbasi R;Porchia M;
1995
Abstract
In order to obtain a rapid and non-destructive method for the evaluation of the thickness of polycrystalline thin films of TiO2 or Ga2O3 deposited on alumina substrates, a procedure based on X-ray absorption, and employing X-ray diffraction at glancing angles, was optimized. The results were compared with SEM observations and an agreement within 25% was obtained.File in questo prodotto:
File | Dimensione | Formato | |
---|---|---|---|
prod_228320-doc_56895.pdf
non disponibili
Descrizione: Thickness determination of ceramic thin films by X-ray absorption analysis
Dimensione
820.35 kB
Formato
Adobe PDF
|
820.35 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.