Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 1)mm2. Dot dimensions and spacings range from 500 nm to 1m and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.
Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques
Annamaria GERARDINO;Gianluca GUBBIOTTI;
2002
Abstract
Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel rectangular and triangular dots and antidots on an area of (1 1)mm2. Dot dimensions and spacings range from 500 nm to 1m and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.File in questo prodotto:
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Descrizione: Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques
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