Internal friction measurements in the kHz range have been performed on Ta containing D, O, and N at liquid-helium temperature. A relaxation process is observed below 60 K showing a sharp discontinuity in the slope at the normal-superconductor transition temperature. The process is interpreted as relaxation of a two-level system consisting of O (N)-D complexes interacting mainly with the conduction electrons.

Anelastic Relaxation due to the Tunneling of Trapped D in Tantalum

F Cordero
1987

Abstract

Internal friction measurements in the kHz range have been performed on Ta containing D, O, and N at liquid-helium temperature. A relaxation process is observed below 60 K showing a sharp discontinuity in the slope at the normal-superconductor transition temperature. The process is interpreted as relaxation of a two-level system consisting of O (N)-D complexes interacting mainly with the conduction electrons.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/125481
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