The electron ionization mass spectrometric behaviour of a new class of hafnocene dialcoholates, and, for comparison, of hafnocene dichloride, is discussed. They are also compared on the basis of mass-analysed ion kinetic energy spectrometry. Fragmentation patterns of oxygen-containing species give relevant information on their potential as precursors for the deposition of HfO2 thin films via metal-organic chemical vapour deposition.

MASS-SPECTROMETRIC STUDIES OF SOME NEW HAFNOCENE DIALCOHOLATES

ROSSETTO G;
1993

Abstract

The electron ionization mass spectrometric behaviour of a new class of hafnocene dialcoholates, and, for comparison, of hafnocene dichloride, is discussed. They are also compared on the basis of mass-analysed ion kinetic energy spectrometry. Fragmentation patterns of oxygen-containing species give relevant information on their potential as precursors for the deposition of HfO2 thin films via metal-organic chemical vapour deposition.
1993
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
CHEMICAL VAPOR-DEPOSITION
THIN-FILMS
ZIRCONIUM
COMPLEXES
TITANIUM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/126201
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