An aspect which has hindered the development of ferroelectric memories is dielectric fatigue and to resolve this conducting oxides are promising candidates as an electrode material for lead zirconate titanate thin films. In this work ferroelectric films have been grown by pulsed laser deposition on ruthenium oxide electrodes. The phase distribution, microstructure and the effect of subsequent heat treatment have been studied by grazing angle X ray diffraction and electron microscopy; the results and implications for use of RuO2 as the bottom electrode during vapour phase deposition are discussed.

Microstructural Characterisation of Pb(Zr0.52Ti0.48)O3 Thin Films Deposited on RuO2 Electrodes by Laser Ablation

-
1996

Abstract

An aspect which has hindered the development of ferroelectric memories is dielectric fatigue and to resolve this conducting oxides are promising candidates as an electrode material for lead zirconate titanate thin films. In this work ferroelectric films have been grown by pulsed laser deposition on ruthenium oxide electrodes. The phase distribution, microstructure and the effect of subsequent heat treatment have been studied by grazing angle X ray diffraction and electron microscopy; the results and implications for use of RuO2 as the bottom electrode during vapour phase deposition are discussed.
1996
Inglese
1996 MRS Spring Meeting - Symposium T - Ferroelectric Thin Films V
1996 MRS Spring Meeting
433
249
253
http://journals.cambridge.org/article_S1946427400222161
Sì, ma tipo non specificato
1996
Santa Fe, USA
1
none
A De Benedittis; A. Di Cristoforo; P. Mengucci; G. Majni; A. Diodati; F. Leccabue; B.E. Watts; D. Seuret;J. Smeets
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/128303
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