The experimental characterization of an aperiodic reflecting multilayer (ML) structure designed to reflect and compress attosecond pulses in the extreme ultraviolet spectral region is presented. The MLs are designed for the 75-105 eV spectral interval with suitable reflectance and phase behavior, in particular high total spectral reflectivity coupled with very wide bandwidth and spectral phase compensation. The experimental phase behavior of the multilayer has been obtained through electron photoemission signal using an innovative method that is presented and discussed in this paper. With this ML we have demonstrated pulse compression by reflection from 450 as to 130 as. (C) 2009 Optical Society of America

Realization and characterization of an XUV multilayer coating for attosecond pulses

Maria Guglielmina Pelizzo;
2009

Abstract

The experimental characterization of an aperiodic reflecting multilayer (ML) structure designed to reflect and compress attosecond pulses in the extreme ultraviolet spectral region is presented. The MLs are designed for the 75-105 eV spectral interval with suitable reflectance and phase behavior, in particular high total spectral reflectivity coupled with very wide bandwidth and spectral phase compensation. The experimental phase behavior of the multilayer has been obtained through electron photoemission signal using an innovative method that is presented and discussed in this paper. With this ML we have demonstrated pulse compression by reflection from 450 as to 130 as. (C) 2009 Optical Society of America
2009
EXTREME-ULTRAVIOLET LITHOGRAPHY
MIRRORS
DESIGN
REFLECTION
OPTICS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/12879
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