As capping represents one of the most important ways of protecting the GaAs (100) surface from air oxidation during the transfer from the MBE chamber to another UHV system not directly coonected with it. The paper describes the most relevant results achied by scanning probe microscopy on GaAs surfaces after thermal decapping of As-capped GaAs (100) surfaces.

Thermal decapping of As-capped GaAs (100) surfaces: a scanning probe microscopy study

G Padeletti;GM Ingo;
1996

Abstract

As capping represents one of the most important ways of protecting the GaAs (100) surface from air oxidation during the transfer from the MBE chamber to another UHV system not directly coonected with it. The paper describes the most relevant results achied by scanning probe microscopy on GaAs surfaces after thermal decapping of As-capped GaAs (100) surfaces.
1996
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
0-471-95899-9
SEMICONDUCTOR
GaAs
Scanning probe microscopy
X-RAY PHOTOELECTRON SPECTROSCOPY
GROWTH MODEL
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/129212
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