As capping represents one of the most important ways of protecting the GaAs (100) surface from air oxidation during the transfer from the MBE chamber to another UHV system not directly coonected with it. The paper describes the most relevant results achied by scanning probe microscopy on GaAs surfaces after thermal decapping of As-capped GaAs (100) surfaces.

Thermal decapping of As-capped GaAs (100) surfaces: a scanning probe microscopy study

G Padeletti;GM Ingo;
1996

Abstract

As capping represents one of the most important ways of protecting the GaAs (100) surface from air oxidation during the transfer from the MBE chamber to another UHV system not directly coonected with it. The paper describes the most relevant results achied by scanning probe microscopy on GaAs surfaces after thermal decapping of As-capped GaAs (100) surfaces.
1996
Istituto per lo Studio dei Materiali Nanostrutturati - ISMN
Inglese
H.J. Mathieu, B. Reihl, D. Briggs
ECASIA 1995 - Proceedings of the European Conference on Applications of Surface and Interface Analysis
ECASIA 95, 6TH European Conference on Applications of Surface and Interface Analysis
Volume unico
399
402
4
0-471-95899-9
John Wiley & Sons Ltd.
Chichester
REGNO UNITO DI GRAN BRETAGNA
Sì, ma tipo non specificato
9-13 October 1995
Montreaux, Switzerland
SEMICONDUCTOR
GaAs
Scanning probe microscopy
X-RAY PHOTOELECTRON SPECTROSCOPY
GROWTH MODEL
4
none
Scavia, G; Padeletti, G; Ingo, Gm; Sorba, L
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/129212
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