We have clearly evidenced the contribution of true surface states, in the range 1.8-2.5 eV, to the optical anisotropy of the GaAs(001)2×4 surface grown in situ by molecular beam epitaxy. These spectral features are well below the photon energy (2.9 eV) where bulklike anisotropies appear in coincidence with the E1 bulk critical point. The surface character is established by studying the evolution of the reflectance anisotropy spectroscopy spectra versus oxygen exposure. The interpretation is strengthened by comparison with high-resolution electron-energy-loss spectra measured on the same surface and by first-principles density-functional theory calculations.

Surface states at the GaAs(001)2×4 surface

E Placidi;C Hogan;
2004

Abstract

We have clearly evidenced the contribution of true surface states, in the range 1.8-2.5 eV, to the optical anisotropy of the GaAs(001)2×4 surface grown in situ by molecular beam epitaxy. These spectral features are well below the photon energy (2.9 eV) where bulklike anisotropies appear in coincidence with the E1 bulk critical point. The surface character is established by studying the evolution of the reflectance anisotropy spectroscopy spectra versus oxygen exposure. The interpretation is strengthened by comparison with high-resolution electron-energy-loss spectra measured on the same surface and by first-principles density-functional theory calculations.
2004
Istituto di Struttura della Materia - ISM - Sede Roma Tor Vergata
INFM
GaAs(001)2×4 surface
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/12987
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