An inexpensive, high-volume CVD production system for a protective oxide coating is described. The critical point with such a process is the precursor mixer and injector head? and an original and simple structure has been designed (see Figure). Uniform, adherent, good quality TiO2 anatase films have been obtained and their functionality at high temperatures has been tested

TiO2 coating by atmospheric pressure MOCVD in a conveyor belt furnace for industrial applications

Gerbasi R;Porchia M;
1999

Abstract

An inexpensive, high-volume CVD production system for a protective oxide coating is described. The critical point with such a process is the precursor mixer and injector head? and an original and simple structure has been designed (see Figure). Uniform, adherent, good quality TiO2 anatase films have been obtained and their functionality at high temperatures has been tested
1999
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
CHEMICAL-VAPOR-DEPOSITION
TITANIUM TETRAISOPROPOXIDE
FILMS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/131784
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