We report on magneto-optical Kerr e!ect (MOKE) measurements performed in the range 4}300 K on "ve epitaxial Cu/Ni/Cu/Si (1 1 1) heterostructures, grown by UHV evaporation, with the Ni layer thickness d varying in the range between 30 and 10 As . In a previous work, we showed that, at room temperature, the magnetization lies preferentially in-plane for d*30 As while it switches out-of-plane when 15)d)25 As . In this work, we show that on further reducing the "lm thickness the magnetization undergoes a second reorientation transition. For d"10 As an in-plane magnetization is found with a coercive "eld which becomes negligible above 200 K. No orientation transition is observed as a function of temperature for any of the specimens analyzed. However, the estimated coercive "eld and the loop squareness decrease monotonically with increasing temperature.
Temperature dependence of magnetic properties in epitaxial Cu/Ni/Cu/Si(111) measured by magneto-optical Kerr effect
G Gubbiotti;G Carlotti;
1999
Abstract
We report on magneto-optical Kerr e!ect (MOKE) measurements performed in the range 4}300 K on "ve epitaxial Cu/Ni/Cu/Si (1 1 1) heterostructures, grown by UHV evaporation, with the Ni layer thickness d varying in the range between 30 and 10 As . In a previous work, we showed that, at room temperature, the magnetization lies preferentially in-plane for d*30 As while it switches out-of-plane when 15)d)25 As . In this work, we show that on further reducing the "lm thickness the magnetization undergoes a second reorientation transition. For d"10 As an in-plane magnetization is found with a coercive "eld which becomes negligible above 200 K. No orientation transition is observed as a function of temperature for any of the specimens analyzed. However, the estimated coercive "eld and the loop squareness decrease monotonically with increasing temperature.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
