Epitaxial Fe films, with thickness in the range between 2.5 and 12A° , were grown in UHV conditions on the 7×7 reconstructed (111)-Si surface, with a Cu 35A° thick buffer layer, using the so-called metal-metal epitaxy on silicon (MMES). Kikuchi electron diffraction showed that the growth of Fe on Cu/Si(111) occurs first by formation of a pseudomorphic film of c-Fe(111), about two to three atomic layers thick, and by the successive growth of bcc Fe(110) domains in the Kurdjumov-Sachs orientation, in agreement with our previous low-energy electron diffraction observations. Kerr effect measurements carried out at low temperatures (20-150 K) revealed that Fe films thinner than 5-6A° are ferromagnetic with an easy axis magnetization orthogonal to the film plane. With increasing Fe thickness, in coincidence with the fcc-to-bcc structural transformation, the easy axis switches to the in-plane orientation over a finite range of thickness

Perpendicular magnetization in epitaxial Cu/Fe/Cu/Si(111) ultrathin films

G Gubbiotti;
2000

Abstract

Epitaxial Fe films, with thickness in the range between 2.5 and 12A° , were grown in UHV conditions on the 7×7 reconstructed (111)-Si surface, with a Cu 35A° thick buffer layer, using the so-called metal-metal epitaxy on silicon (MMES). Kikuchi electron diffraction showed that the growth of Fe on Cu/Si(111) occurs first by formation of a pseudomorphic film of c-Fe(111), about two to three atomic layers thick, and by the successive growth of bcc Fe(110) domains in the Kurdjumov-Sachs orientation, in agreement with our previous low-energy electron diffraction observations. Kerr effect measurements carried out at low temperatures (20-150 K) revealed that Fe films thinner than 5-6A° are ferromagnetic with an easy axis magnetization orthogonal to the film plane. With increasing Fe thickness, in coincidence with the fcc-to-bcc structural transformation, the easy axis switches to the in-plane orientation over a finite range of thickness
2000
Istituto Officina dei Materiali - IOM -
Low energy electron diffraction (LEED)
Magnetic films
Magnetic phenomena
Metal-semiconductor interfaces
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/132717
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