The aspect ratio and faceting evolution of quantum dots grown at 500 degrees C were studied as a function of postgrowth annealing temperature. We show that faceting and aspect ratio strictly depend on growth conditions. The evolution toward {136} and {137} facets is kinetically limited and occurs under different experimental conditions. Furthermore long annealing procedures lead to the occurrence of low aspect ratio domes different from those forming at higher growth temperatures.

Annealing effects on faceting of InAs/GaAs(001) quantum dots

E Placidi;
2009

Abstract

The aspect ratio and faceting evolution of quantum dots grown at 500 degrees C were studied as a function of postgrowth annealing temperature. We show that faceting and aspect ratio strictly depend on growth conditions. The evolution toward {136} and {137} facets is kinetically limited and occurs under different experimental conditions. Furthermore long annealing procedures lead to the occurrence of low aspect ratio domes different from those forming at higher growth temperatures.
2009
annealing
gallium arsenide
III-V semiconductors
semiconductor growth
semiconductor quantum dots
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/13664
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