Uniform, good-quality TiO2 thin films were deposited on dental implants by employing Metal-Organic Chemical Vapour Deposition (MOCVD) technique at 420°C and using titaniumtetraisopropoxide as precursor. The films resulted anatase high oriented in (200) direction. These dental implants were therefore tested 'in vivo' and showed higher adhesion values in the first three months, with torque resistance increased by about 50% with respect to the untreated implants. Structural data are discussed to explain such good performance.
MOCVD deposition of TiO2 thin films on titanium dental implants
Gerbasi R;Porchia M;
1996
Abstract
Uniform, good-quality TiO2 thin films were deposited on dental implants by employing Metal-Organic Chemical Vapour Deposition (MOCVD) technique at 420°C and using titaniumtetraisopropoxide as precursor. The films resulted anatase high oriented in (200) direction. These dental implants were therefore tested 'in vivo' and showed higher adhesion values in the first three months, with torque resistance increased by about 50% with respect to the untreated implants. Structural data are discussed to explain such good performance.File in questo prodotto:
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