In-plane bandgap engineering of dilute nitrides by spatially delimited hydrogen irradiation (left, microphotoluminescence image of GaAsN) or displacement (right, cathodoluminescence image of hydrogenated GaAsN) is reported.

The electronic properties in the growth plane of a semiconductor was achieved by in-plane engineering of the effects of hydrogen on dilute nitrides of Galium hetrostructure. The replacement of Arsenic atoms by Nitrogen atoms led to nonlinear effects in the electronic properties of host lattice. Focussing energetic electron beams on the surface of hydrogenated semiconducting Ga hetrostructure displaced Hydrogen atoms from their Nitrogen passivation sites leading to decrease of crystal bandgap in the spatial region. The silver wire that was deposited by standard optical lithography on semiconducting Ga hetrostructure and no light emission was detected at the energy gap of untreated sample outside the wire. A two-dimensional image of wire obtained by cathodoluminescence (CL) spectroscopy was recorded at 5K temperature. The CL intensity corresponding to photons emitted from the well region after impingement of the electron beams was given by an integral equation.

In-plane bandgap engineering by modulated hydrogenation of dilute nitride semiconductors

2006

Abstract

The electronic properties in the growth plane of a semiconductor was achieved by in-plane engineering of the effects of hydrogen on dilute nitrides of Galium hetrostructure. The replacement of Arsenic atoms by Nitrogen atoms led to nonlinear effects in the electronic properties of host lattice. Focussing energetic electron beams on the surface of hydrogenated semiconducting Ga hetrostructure displaced Hydrogen atoms from their Nitrogen passivation sites leading to decrease of crystal bandgap in the spatial region. The silver wire that was deposited by standard optical lithography on semiconducting Ga hetrostructure and no light emission was detected at the energy gap of untreated sample outside the wire. A two-dimensional image of wire obtained by cathodoluminescence (CL) spectroscopy was recorded at 5K temperature. The CL intensity corresponding to photons emitted from the well region after impingement of the electron beams was given by an integral equation.
2006
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
INFM
In-plane bandgap engineering of dilute nitrides by spatially delimited hydrogen irradiation (left, microphotoluminescence image of GaAsN) or displacement (right, cathodoluminescence image of hydrogenated GaAsN) is reported.
GAAS
CATHODOLUMINESCENCE
DOTS
GAP
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/143484
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