High-kappa dielectrics for insulating layers are a current key ingredient of microelectronics. X2O3 sesquioxide compounds are among the candidates. Here, we show for a typical material of this class, Sc2O3, that the relatively modest dielectric constant of its crystalline phase is enhanced in the amorphous phase by over 40% (from similar to 15 to similar to 22). This is due to the disorder-induced activation of low frequency cation-related modes which are inactive or inefficient in the crystal and by the conservation of effective dynamical charges (a measure of atomic polarizability). The analysis employs density-functional energy-force and perturbation-theory calculations of the dielectric response of amorphous samples generated by pair-potential molecular dynamics. (C) 2008 American Institute of Physics.

Dielectric constant boost in amorphous sesquioxides

Delugas P;Fiorentini V;Filippetti A
2008

Abstract

High-kappa dielectrics for insulating layers are a current key ingredient of microelectronics. X2O3 sesquioxide compounds are among the candidates. Here, we show for a typical material of this class, Sc2O3, that the relatively modest dielectric constant of its crystalline phase is enhanced in the amorphous phase by over 40% (from similar to 15 to similar to 22). This is due to the disorder-induced activation of low frequency cation-related modes which are inactive or inefficient in the crystal and by the conservation of effective dynamical charges (a measure of atomic polarizability). The analysis employs density-functional energy-force and perturbation-theory calculations of the dielectric response of amorphous samples generated by pair-potential molecular dynamics. (C) 2008 American Institute of Physics.
2008
Istituto per la Microelettronica e Microsistemi - IMM
INFM
FUNCTIONAL PERTURBATION-THEORY
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/144000
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