FePt thin films were epitaxially grown by RF sputtering on MgO ( 1 0 0) substrates at 550 degrees C, followed by in situ annealing at the same temperature. The in situ annealing was found to improve the magnetic characteristics: i.e., the increase in magnetic squareness up to 0.9 and increase in the ratio between anisotropy and coercivity (epsilon = anisotropy field/coercive field = 35.9 for 115 min annealing). Remarkably, a decrease in grain size was also found to occur by increasing the annealing time. (c) 2007 Elsevier B.V. All rights reserved.

Grain size reduction and magnetic properties improvement by in situ annealing of FePt epitaxial thin films

Albertini F;Nasi L;Casoli F;Fabbrici S;Luches P;Valeri S
2007

Abstract

FePt thin films were epitaxially grown by RF sputtering on MgO ( 1 0 0) substrates at 550 degrees C, followed by in situ annealing at the same temperature. The in situ annealing was found to improve the magnetic characteristics: i.e., the increase in magnetic squareness up to 0.9 and increase in the ratio between anisotropy and coercivity (epsilon = anisotropy field/coercive field = 35.9 for 115 min annealing). Remarkably, a decrease in grain size was also found to occur by increasing the annealing time. (c) 2007 Elsevier B.V. All rights reserved.
2007
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
INFM
MICROSTRUCTURE
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/148171
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