X-ray reflectometry (XRR) is a well established technique to evaluate quantitatively electron density, thickness and roughness of thin layers. In this paper, results of the first world-wide XRR round-robin experiment, involving 20 laboratories, are presented and discussed. The round-robin experiment was performed within the framework of the VAMAS Project 'X-ray reflectivity measurements for evaluation of thin films and multilayers', the aim of which is to produce a 'good practice' manual for XRR. The reproducibility of measurements obtained using different equipment has been investigated. The influence of the fitting of the experimental data was shown to be non-negligible compared with the experimental factors. The dynamic intensity range proves to be an important parameter for obtaining a good quality measurement. A simpler test sample which does not develop a surface oxide layer over time is now the subject of a follow-up study.

Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment

Lamperti A;Milita S;C Wiemer
2008

Abstract

X-ray reflectometry (XRR) is a well established technique to evaluate quantitatively electron density, thickness and roughness of thin layers. In this paper, results of the first world-wide XRR round-robin experiment, involving 20 laboratories, are presented and discussed. The round-robin experiment was performed within the framework of the VAMAS Project 'X-ray reflectivity measurements for evaluation of thin films and multilayers', the aim of which is to produce a 'good practice' manual for XRR. The reproducibility of measurements obtained using different equipment has been investigated. The influence of the fitting of the experimental data was shown to be non-negligible compared with the experimental factors. The dynamic intensity range proves to be an important parameter for obtaining a good quality measurement. A simpler test sample which does not develop a surface oxide layer over time is now the subject of a follow-up study.
2008
Istituto per la Microelettronica e Microsistemi - IMM
INFM
X-ray reflectivity
round-robin experiment
thickness of thin films
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/154474
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 47
social impact