We compare the In content of quaternary InxGa1-xAs1-yNy and ternary InxGa1-xAs layers grown by plasma-assisted molecular beam epitaxy in similar conditions. Indium incorporation is found to decrease monotonically with increasing nitrogen content. The magnitude of the reduction strongly depends on N concentration, reaching about 20% of the nominal In content for N concentrations of y=0.044. (c) 2006 American Institute of Physics.

Nitrogen-induced hindering of in incorporation in InGaAsN

Rubini S;Modesti S;Carlino E;Martelli F;Franciosi A;
2006

Abstract

We compare the In content of quaternary InxGa1-xAs1-yNy and ternary InxGa1-xAs layers grown by plasma-assisted molecular beam epitaxy in similar conditions. Indium incorporation is found to decrease monotonically with increasing nitrogen content. The magnitude of the reduction strongly depends on N concentration, reaching about 20% of the nominal In content for N concentrations of y=0.044. (c) 2006 American Institute of Physics.
2006
INFM
MOLECULAR-BEAM EPITAXY
TEMPERATURE
GAINASN
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/156529
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