Chemical implantation of Group 5 cations [Nb(III), Nb(V), and Ta(V)] has been carried out under mild conditions by the reaction of N,N-dialkylcarbamato derivatives M(O2CNR2)(n) (M = Nb, Ta)with silanol groups of amorphous silica, carbon dioxide, and secondary amine being released in the process. The amount of supported cations depends on the metal and on the initial number of N, N-dialkylcarbamato ligands on M; partial reduction to the +4 oxidation state occurs in the case of Nb(O2CNR2)(5). (C) 2010 Elsevier B. V. All rights reserved.
N,N-Dialkylcarbamato derivatives of niobium and tantalum as precursors to metal-functionalized silica surfaces
Forte Claudia;Pinzino Calogero;
2011
Abstract
Chemical implantation of Group 5 cations [Nb(III), Nb(V), and Ta(V)] has been carried out under mild conditions by the reaction of N,N-dialkylcarbamato derivatives M(O2CNR2)(n) (M = Nb, Ta)with silanol groups of amorphous silica, carbon dioxide, and secondary amine being released in the process. The amount of supported cations depends on the metal and on the initial number of N, N-dialkylcarbamato ligands on M; partial reduction to the +4 oxidation state occurs in the case of Nb(O2CNR2)(5). (C) 2010 Elsevier B. V. All rights reserved.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
