In this paper, two matched microstrip line configurations for the excitation of magnetostatic wave resonators (SER) have been studied for optimizing the SER performances. The first transducer was designed on a bulk silicon substrate, and the second one suspended on a micromachined membrane, to be realized by means of wet anisotropic etching. These configurations were simulated by Microwave Office.

Modeling of Matched Microstrip Lines on Bulk and Micromachined Structures

Marcelli R;
2003

Abstract

In this paper, two matched microstrip line configurations for the excitation of magnetostatic wave resonators (SER) have been studied for optimizing the SER performances. The first transducer was designed on a bulk silicon substrate, and the second one suspended on a micromachined membrane, to be realized by means of wet anisotropic etching. These configurations were simulated by Microwave Office.
2003
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
Editors: Dan Dascalu and Adrian Rusu
Proceedings of the 2003 International Semiconductor Conference, IEEE CAS 2003
2003 International Semiconductor Conference, IEEE CAS 2003
121
124
4
0-7803-7821-0
CAS Office
Bucuresti
ROMANIA
Sì, ma tipo non specificato
September 28-October 2, 2003
Sinaia, Romania
Microstrips
Micromachining
4
none
Cismaru, A; Marcelli, R; Sajin, G; Craciunoiu, F
273
info:eu-repo/semantics/conferenceObject
04 Contributo in convegno::04.01 Contributo in Atti di convegno
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/165715
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