Soft imprinting lithography assisted by UV light (soft UV-NIL) takes advantage of both, UV-nanoimprint and soft lithography. This technique, which can be applied for the replication of nanometer size features over large areas, is suitable for the patterning of nanostructures like photonic crystals with high throughput and high accuracy. In this work, we demonstrate the fabrication of two dimensional silicon-on-insulator photonic crystal slabs with and without line defects by using soft UV-NIL. Measurement of photonic mode dispersion by means of variable angle reflectance assesses the quality of the fabricated samples. (c) 2006 Published by Elsevier B.V.
Fabrication of SOI photonic crystal slabs by soft UV-nanoimprint lithography
2006
Abstract
Soft imprinting lithography assisted by UV light (soft UV-NIL) takes advantage of both, UV-nanoimprint and soft lithography. This technique, which can be applied for the replication of nanometer size features over large areas, is suitable for the patterning of nanostructures like photonic crystals with high throughput and high accuracy. In this work, we demonstrate the fabrication of two dimensional silicon-on-insulator photonic crystal slabs with and without line defects by using soft UV-NIL. Measurement of photonic mode dispersion by means of variable angle reflectance assesses the quality of the fabricated samples. (c) 2006 Published by Elsevier B.V.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
