High lateral resolution direct imaging of surfaces with chemical sensitivity is of increasing importance for basic and applied research in the field of surface and materials science. A novel and versatile beamline, to be employed for the spectromicroscopic study of surfaces in the submicron range, is now available at Elettra. The beamline, named "Nanospectroscopy", serves an end-station equipped with a Spectroscopic Photo-Emission and Low Energy Electron Microscope (SPELEEM). This microscope combines the ability to perform XPEEM (X-ray Photo-Emission Electron Microscopy), small spot XPS (X-ray Photoelectron Spectroscopy), XPD (X-ray Photoelectron Diffraction), LEEM and LEED (Low Energy Electron Microscopy and Diffraction, respectively).
High lateral resolution spectroscopic imaging of surfaces: The undulator beamline "nanospectroscopy" at Elettra
Heun S Heun S;
2003
Abstract
High lateral resolution direct imaging of surfaces with chemical sensitivity is of increasing importance for basic and applied research in the field of surface and materials science. A novel and versatile beamline, to be employed for the spectromicroscopic study of surfaces in the submicron range, is now available at Elettra. The beamline, named "Nanospectroscopy", serves an end-station equipped with a Spectroscopic Photo-Emission and Low Energy Electron Microscope (SPELEEM). This microscope combines the ability to perform XPEEM (X-ray Photo-Emission Electron Microscopy), small spot XPS (X-ray Photoelectron Spectroscopy), XPD (X-ray Photoelectron Diffraction), LEEM and LEED (Low Energy Electron Microscopy and Diffraction, respectively).I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
