We investigate the memory function at room temperature in devices based on quantum dots. By Low Pressure Chemical Vapour Deposition (LPCVD) we deposited Si dots embedded in SiO2. On these devices flat band voltage shifts were well detected at low write voltages for write times of the order of milliseconds, and, furthermore, a plateau in the flat band voltage shift, maybe consequence of Coulomb blockade, was observed.

Memory effects in single-electron nanostructures

Crupi I;
2002

Abstract

We investigate the memory function at room temperature in devices based on quantum dots. By Low Pressure Chemical Vapour Deposition (LPCVD) we deposited Si dots embedded in SiO2. On these devices flat band voltage shifts were well detected at low write voltages for write times of the order of milliseconds, and, furthermore, a plateau in the flat band voltage shift, maybe consequence of Coulomb blockade, was observed.
2002
3-908450-64-0
memory
quantum dot
single-electron
Coulomb blockade.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/171876
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