A new method for direct patterning of Poly(dimethylsiloxane) (PDMS) structures is presented. This technique will be named Light Induced Patterning (LIP) as it's induced by laser light through a functionalized substrate of Lithium Niobate (LN) crystal. The process is a full field technique that, conversely to the point wise ones, allows PDMS patterning with a single laser light exposure.

Self-induced patterning of PDMS microstructures by photorefractive effect on Lithium Niobate crystals

Miccio L;Paturzo M;Finizio A;Ferraro P
2011

Abstract

A new method for direct patterning of Poly(dimethylsiloxane) (PDMS) structures is presented. This technique will be named Light Induced Patterning (LIP) as it's induced by laser light through a functionalized substrate of Lithium Niobate (LN) crystal. The process is a full field technique that, conversely to the point wise ones, allows PDMS patterning with a single laser light exposure.
2011
Istituto di Scienze Applicate e Sistemi Intelligenti "Eduardo Caianiello" - ISASI
Istituto Nazionale di Ottica - INO
978-1-4577-0533-5
Polymers
Photorefractive materials
Digital holography
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/172691
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