Lattice matched AlxIn1-xAs epitaxial layers grown by molecular beam epitaxy on InP (100) substrates are investigated by Transmission Electron Microscopy and Double Crystal X-ray Diffractometry. Four different regions close to the Alx(I)n(1-x)As/InP heterointerfaces can be detected. The first region, located at the heterointerface is caused by an intermixing of P and As atoms, while the other regions are caused by a small gradient of In content in the epilayer.

Characterisation of AlxIn1-xAs/InP heterointerfaces by transmission electron microscopy

E Carlino;M Catalano;C Giannini;
1993

Abstract

Lattice matched AlxIn1-xAs epitaxial layers grown by molecular beam epitaxy on InP (100) substrates are investigated by Transmission Electron Microscopy and Double Crystal X-ray Diffractometry. Four different regions close to the Alx(I)n(1-x)As/InP heterointerfaces can be detected. The first region, located at the heterointerface is caused by an intermixing of P and As atoms, while the other regions are caused by a small gradient of In content in the epilayer.
1993
Istituto Officina dei Materiali - IOM -
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/175817
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