We present here a novel X-ray diffraction imaging method which allows the determination of local structural properties with spatial resolution (in one dimension) of about 100 nm. The method is based on an Xray microscope whose main element is a waveguide producing a divergent and coherent X-ray beam with vertical dimension below 100 nm. Applications for microelectronics materials and processes are presented.
X-ray nano-diffraction: 100 nm resolution obtained in a novel imaging technique for strain measurement at buried interfaces
Lagomarsino S;Giannini C;De Caro L;Cedola A
2000
Abstract
We present here a novel X-ray diffraction imaging method which allows the determination of local structural properties with spatial resolution (in one dimension) of about 100 nm. The method is based on an Xray microscope whose main element is a waveguide producing a divergent and coherent X-ray beam with vertical dimension below 100 nm. Applications for microelectronics materials and processes are presented.File in questo prodotto:
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