(111)-oriented GaAs heterolayers have been deposited by metalorganic vapour phase epitaxy (MOVPE) at different III-V ratios and growth times on GaP and InP substrates of both A and B polarities. The strain release has been determined by Raman spectroscopy. The growth mechanisms are discussed on the basis of the images obtained by atomic force microscopy.

Raman scattering study and AFM morphological characterization of MOVPE-grown (111)-strained heterostructures

Labardi M;
1996

Abstract

(111)-oriented GaAs heterolayers have been deposited by metalorganic vapour phase epitaxy (MOVPE) at different III-V ratios and growth times on GaP and InP substrates of both A and B polarities. The strain release has been determined by Raman spectroscopy. The growth mechanisms are discussed on the basis of the images obtained by atomic force microscopy.
1996
Raman scattering
atomic force microscopy
File in questo prodotto:
File Dimensione Formato  
prod_214949-doc_49688.pdf

non disponibili

Descrizione: Raman scattering study and AFM morphological characterization of MOVPE-grown (111)-strained heterostructures
Tipologia: Versione Editoriale (PDF)
Dimensione 315.03 kB
Formato Adobe PDF
315.03 kB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/182065
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 11
social impact