Shunt capacitive RF MEMS switches were developed on GaAs substrate, using a III-V technology process that is fully compatible with standard MMIC fabrication. The switches show an insertion loss lower than 0.8 dB and isolation better than 30 dB with resonance frequencies in K-band, according to the switch geometric parameters. Reliability limits due to dielectric charging were overcome by applying suitable fast bipolar actuation waveforms, making the developed switches good candidates for both redundancy (always on/off) and cycled applications.

K-band capacitive MEMS switches on GaAs substrate: Design, fabrication, and reliability

Persano A;Siciliano P;Quaranta F
2012

Abstract

Shunt capacitive RF MEMS switches were developed on GaAs substrate, using a III-V technology process that is fully compatible with standard MMIC fabrication. The switches show an insertion loss lower than 0.8 dB and isolation better than 30 dB with resonance frequencies in K-band, according to the switch geometric parameters. Reliability limits due to dielectric charging were overcome by applying suitable fast bipolar actuation waveforms, making the developed switches good candidates for both redundancy (always on/off) and cycled applications.
2012
Istituto per la Microelettronica e Microsistemi - IMM
RF
TEMPERATURE
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/182885
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 16
social impact