Tiles coming from different positions of the first wall of the RFX experiment have been analyzed via Secondary Ion Mass Spectrometry (SIMS) at the Istituto di Fisica del Plasma (Milan, Italy) and at Istituto Energetica delle Interfasi (Padua, Italy). The objectives are to study the erosion and deposition effects during the plasma discharges and to look at the quality of the boron deposition and original concentrations. The high concentration of oxygen pointed out a boronization driven in presence of oxygen gas.

Boron deposition on RFX graphite tiles studied with Secondary Ion Mass Spectrometry

Ghezzi F;
2007

Abstract

Tiles coming from different positions of the first wall of the RFX experiment have been analyzed via Secondary Ion Mass Spectrometry (SIMS) at the Istituto di Fisica del Plasma (Milan, Italy) and at Istituto Energetica delle Interfasi (Padua, Italy). The objectives are to study the erosion and deposition effects during the plasma discharges and to look at the quality of the boron deposition and original concentrations. The high concentration of oxygen pointed out a boronization driven in presence of oxygen gas.
2007
Istituto di fisica del plasma - IFP - Sede Milano
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/185589
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