Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching step. The results obtained by different research groups vary widely. In this paper we present a review of the most recent advancements of this technique discussing several critical factors that affect the aspect ratio, the length and the etching speed of the microchannel.
Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching
Osellame;Roberto;Cerullo;Giulio;
2012
Abstract
Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching step. The results obtained by different research groups vary widely. In this paper we present a review of the most recent advancements of this technique discussing several critical factors that affect the aspect ratio, the length and the etching speed of the microchannel.File in questo prodotto:
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