Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching step. The results obtained by different research groups vary widely. In this paper we present a review of the most recent advancements of this technique discussing several critical factors that affect the aspect ratio, the length and the etching speed of the microchannel.

Advances in glass Microfabrication Femtosecond laser irradiation followed by chemical etching

Osellame;Roberto;Cerullo;Giulio;
2012

Abstract

Femtosecond laser irradiation followed by chemical etching (F.L.I.C.E.) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure attested in literature, which has been widely studied in the past years, consists of irradiating a glass slab and subsequently apply a chemical etching step. The results obtained by different research groups vary widely. In this paper we present a review of the most recent advancements of this technique discussing several critical factors that affect the aspect ratio, the length and the etching speed of the microchannel.
2012
Istituto di fotonica e nanotecnologie - IFN
Femtosecond laser
Micromachining
Glass
Etching
FUSED-SILICA
DIRECT FLUORINATION
FABRICATION
MECHANISM
PULSES
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/189703
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