A quantitative surface reconstruction technique has been developed for the geometric characterization of three-dimensional structures by using a combined focused ion beam--scanning electron microscopy (FIB-SEM) instrument. A regular pattern of lines is milled at normal incidence on the sample to be characterized and an image is acquired at a large tilt angle. By analyzing the pattern under the tilted view, a quantitative estimation of surface heights is obtained. The technique has been applied to a test sample and nanoscale resolution has been achieved. The reported results are validated by a comparison with atomic force microscopy measurements.

Fast three-dimensional nanoscale metrology in dual-beam FIB-SEM instrumentation

Renato Buzio;
2009

Abstract

A quantitative surface reconstruction technique has been developed for the geometric characterization of three-dimensional structures by using a combined focused ion beam--scanning electron microscopy (FIB-SEM) instrument. A regular pattern of lines is milled at normal incidence on the sample to be characterized and an image is acquired at a large tilt angle. By analyzing the pattern under the tilted view, a quantitative estimation of surface heights is obtained. The technique has been applied to a test sample and nanoscale resolution has been achieved. The reported results are validated by a comparison with atomic force microscopy measurements.
2009
Scanning electron microscopy
Focused Ion Beam
Topography
Nanostructures
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/1934
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