Recently, among other organometallics, metal alkyls have gained relevant importance as precursor compounds in the area of laser-CVD of metal film and microstructures. A great deal of attention has been devoted to the study of their visible/UV laser photochemistry with the aim to achieve the essential understanding needed to control the photoreaction. Several spectroscopic techniques have been used to monitor the photolysis of a variety of volatile metal alkyls and to characterize the energy distribution of the nascent fragments. In many cases a detailed understanding of the process dynamics has been achieved. The influence of UV or visible radiation on molecule-substrate systems has been investigated by revealing the modifications induced in the adsorbate by surface analysis techniques in UHV environments. © 1990.
Photoprocesses in organometallics
Larciprete R
1990
Abstract
Recently, among other organometallics, metal alkyls have gained relevant importance as precursor compounds in the area of laser-CVD of metal film and microstructures. A great deal of attention has been devoted to the study of their visible/UV laser photochemistry with the aim to achieve the essential understanding needed to control the photoreaction. Several spectroscopic techniques have been used to monitor the photolysis of a variety of volatile metal alkyls and to characterize the energy distribution of the nascent fragments. In many cases a detailed understanding of the process dynamics has been achieved. The influence of UV or visible radiation on molecule-substrate systems has been investigated by revealing the modifications induced in the adsorbate by surface analysis techniques in UHV environments. © 1990.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
