The mechanism of dimethylzinc (DMZn) and diethylzinc (DEZn) photofragmentation through two-photon resonant absorption to the lowest electronic dissociative states (A1A, B1IIu) has been investigated by tunable dye-laser multiphoton ionization time-of-flight mass spectroscopy. In the second part of the work, DEZn was chosen as precursor compound for zinc film photodeposition, since MPI-TOF measurement had shown that the main dissociative channel at 248 nm (KrF emission) produced Zn atoms. The organometallic was photolyzed by a focussed KrF excimer laser beam perpendicularly impinging onto a quartz substrate. Localized zinc depositions with thicknesses in the range 300-3000 Å have been obtained and the deposition process has been investigated by monitoring the time evolution of the fraction of a HeNe laser beam transmitted by the growing zinc film. © 1989.
Excimer laser photolysis of organometallic compounds for Zn deposition
Larciprete;
1989
Abstract
The mechanism of dimethylzinc (DMZn) and diethylzinc (DEZn) photofragmentation through two-photon resonant absorption to the lowest electronic dissociative states (A1A, B1IIu) has been investigated by tunable dye-laser multiphoton ionization time-of-flight mass spectroscopy. In the second part of the work, DEZn was chosen as precursor compound for zinc film photodeposition, since MPI-TOF measurement had shown that the main dissociative channel at 248 nm (KrF emission) produced Zn atoms. The organometallic was photolyzed by a focussed KrF excimer laser beam perpendicularly impinging onto a quartz substrate. Localized zinc depositions with thicknesses in the range 300-3000 Å have been obtained and the deposition process has been investigated by monitoring the time evolution of the fraction of a HeNe laser beam transmitted by the growing zinc film. © 1989.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
