Excimer laser-induced photochemistry of dimetylzinc (DMZn) and diethylzinc (DEZn) has been investigated by multiphoton ionization time-of-flight mass spectroscopy. After the results achieved, DEZn was chosen as precursor compound for zinc film photodeposition. The organometallic was photolyzed by a focussed KrF excimer laser beam perpendicularly impinging onto a quartz substrate. Localized zinc deposition with thicknesses in the range (300curly logical or3000) Å has been obtained and the deposition process has been investigated by monitoring the time evolution of the fraction of a He-Ne laser beam transmitted by the growing zinc film. © 1989 Società Italiana di Fisica.

Excimer laser photolysis of Zn dialkyls for Zn deposition

Larciprete R;
1989

Abstract

Excimer laser-induced photochemistry of dimetylzinc (DMZn) and diethylzinc (DEZn) has been investigated by multiphoton ionization time-of-flight mass spectroscopy. After the results achieved, DEZn was chosen as precursor compound for zinc film photodeposition. The organometallic was photolyzed by a focussed KrF excimer laser beam perpendicularly impinging onto a quartz substrate. Localized zinc deposition with thicknesses in the range (300curly logical or3000) Å has been obtained and the deposition process has been investigated by monitoring the time evolution of the fraction of a He-Ne laser beam transmitted by the growing zinc film. © 1989 Società Italiana di Fisica.
1989
Inglese
11
11
1603
1613
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Larciprete, R; Borsella, ; E,
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/199544
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