ArF excimer laser photolysis of Sn(CH3)4, excited in resonance with its first dissociative absorption band, was studied by multiphoton ionization time-of-flight (TOF) mass spectroscopy. Occurrence of methyl elimination after one UV photon absorption was identified detecting the CH3 radicals by dye laser induced resonant ionization at 333.5 nm. Results obtained performing two colour ionization with 193 nm and blue laser photons give evidence for the presence of very efficient UV induced dissociation demonstrating the suitability of Sn(CH3)4 as tin precursor for laser induced film deposition.
ArF excimer laser photolysis of tetramethyltin Sn(CH3)4 probed by dye laser mass spectroscopy
R Larciprete;
1989
Abstract
ArF excimer laser photolysis of Sn(CH3)4, excited in resonance with its first dissociative absorption band, was studied by multiphoton ionization time-of-flight (TOF) mass spectroscopy. Occurrence of methyl elimination after one UV photon absorption was identified detecting the CH3 radicals by dye laser induced resonant ionization at 333.5 nm. Results obtained performing two colour ionization with 193 nm and blue laser photons give evidence for the presence of very efficient UV induced dissociation demonstrating the suitability of Sn(CH3)4 as tin precursor for laser induced film deposition.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
