Using a ring microstrip resonator technique, the surface impedance of V3Si sputtered films has been measured as a function of temperature and de and rf field amplitude. The results are analyzed in terms of the Bardeen-Cooper-Schrieffer theory and of a grain-boundary Josephson model, and discussed in the framework of the possible application of V3Si as a thin-film coating of superconducting rf cavities for particle accelerators. (C) 1995 American Institute of Physics.
SURFACE IMPEDANCE MEASUREMENTS OF SUPERCONDUCTING V3SI FILMS BY A MICROSTRIP RESONATOR TECHNIQUE
Salluzzo M;
1995
Abstract
Using a ring microstrip resonator technique, the surface impedance of V3Si sputtered films has been measured as a function of temperature and de and rf field amplitude. The results are analyzed in terms of the Bardeen-Cooper-Schrieffer theory and of a grain-boundary Josephson model, and discussed in the framework of the possible application of V3Si as a thin-film coating of superconducting rf cavities for particle accelerators. (C) 1995 American Institute of Physics.File in questo prodotto:
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